The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Feb. 20, 2018
Applicant:

L'oreal, Paris, FR;

Inventors:

Jonathan Faig, Madison, NJ (US);

David Chan, Edison, NJ (US);

Assignee:

L'OREAL, Paris, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 8/73 (2006.01); A61K 8/02 (2006.01); A61K 8/42 (2006.01); A61Q 19/00 (2006.01); A61K 8/34 (2006.01); A61K 8/20 (2006.01); A61Q 19/08 (2006.01); A61K 8/25 (2006.01);
U.S. Cl.
CPC ...
A61K 8/733 (2013.01); A61K 8/0212 (2013.01); A61K 8/20 (2013.01); A61K 8/25 (2013.01); A61K 8/345 (2013.01); A61K 8/42 (2013.01); A61Q 19/00 (2013.01); A61Q 19/08 (2013.01);
Abstract

The instant disclosure relates to masks, methods for making masks, methods for improving film elasticity of masks, and to methods of treating skin with masks. The masks are formed by applying a mask base composition onto a surface, the mask base composition comprising: (i) alginic acid and/or a salt thereof; (ii) hectorite (lithium magnesium sodium silicate); (iii) one or more water-soluble solvents; and (iv) water; and exposing the mask base composition to a crosslinking composition for a time sufficient to crosslink the alginic acid and/or a salt thereof and form a final mask, the crosslinking composition being an aqueous liquid comprising (i) one or more polyvalent cations of one or more metals; and (ii) water. The instant disclosure further relates to masks formed by the disclosed methods and to kits comprising the compositions for making and/or using the masks.


Find Patent Forward Citations

Loading…