The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Sep. 03, 2019
Applicant:

Mitsui Mining & Smelting Co., Ltd., Tokyo, JP;

Inventors:

Takahiro Ito, Ageo, JP;

Tsukasa Takahashi, Ageo, JP;

Masaru Hyakutake, Ageo, JP;

Teruaki Yagi, Ageo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 10/0562 (2010.01); C01B 25/14 (2006.01); C01B 17/45 (2006.01); C01B 17/22 (2006.01); H01M 10/0525 (2010.01); H01M 4/136 (2010.01); H01M 4/58 (2010.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 10/0562 (2013.01); C01B 17/22 (2013.01); C01B 17/45 (2013.01); C01B 25/14 (2013.01); H01M 4/136 (2013.01); H01M 4/58 (2013.01); H01M 10/0525 (2013.01); C01P 2002/74 (2013.01); H01M 2004/027 (2013.01); H01M 2004/028 (2013.01);
Abstract

Sulfide-type compound particles microparticulated, having an argyrodite-type crystal structure, and including lithium (Li), phosphorus (P), sulfur (S), and a halogen (Ha). As sulfide-type compound particles that can inhibit generation of hydrogen sulfide gas even upon contact with moisture in the atmosphere, provided are sulfide-type compound particles having D50 in a volume-basis particle size distribution of 50 μm or less and having an occupancy of sulfur (S) and the halogen (Ha) in the S3 (4a) site, as calculated by a neutron diffraction measurement, of 85% or more.


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