The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Jul. 13, 2020
Headway Technologies, Inc., Milpitas, CA (US);
Shohei Kawasaki, Sunnyvale, CA (US);
Wenyu Chen, San Jose, CA (US);
Tetsuya Roppongi, San Jose, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
A spin transfer torque reversal assisted magnetic recording (STRAMR) device is disclosed wherein a flux guiding layer (FGL) magnetization flips to an opposite direction opposing the write gap (WG) field because of spin torque from an adjacent spin polarization (SP) layer and spin injection layer (SIL) when a current (Ia) of sufficient density is applied across the device and between the main pole (MP) and trailing shield (TS) thereby enhancing the MP write field. The SP layer adjoins the MP or TS and maintains a magnetization in the WG field direction. One or both of the SIL and FGL has a spin polarization from −0.4 to 0.3 and may be doped with C, N, or B so that the extent of FGL flipping is greater at a given current density than in the prior art where all magnetic layers within the STRAMR device have a positive spin polarization ≥0.4.