The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Apr. 29, 2020
Split Software, Inc., Redwood City, CA (US);
Elizabeth Eardley, Scotland, GB;
Henry Jewkes, Denver, CO (US);
Sophie Harpur, Scotland, GB;
Trevor Stuart, San Mateo, CA (US);
Pierre-Alexandre Masse, Redwood City, CA (US);
Patricio Echagüe, Redwood City, CA (US);
SPLIT SOFTWARE, INC., Redwood City, CA (US);
Abstract
A method and apparatus for application anomaly detection and remediation is described. The method may include receiving a plurality of event tracking messages generated by configurable applications after a feature treatment is deployed to configurable applications running on a first set of end user systems, and associating the feature treatment with values of a metric from the event messages that are attributable to the feature treatment being executed by the one or more configurable applications. The method may also include determining an impact of the feature treatment on the degradation of the metric when compared to a control value of the metric determined from a second plurality of end user systems that are not exposed to the feature treatment. Then method may further include, in response to detecting the statistically significant degradation of the metric, performing one or more actions to remediate the undesired impact of the feature treatment on the execution of the application.