The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Sep. 09, 2016
Applicant:
National Cheng Kung University, Tainan, TW;
Inventors:
Assignee:
NATIONAL CHENG KUNG UNIVERSITY, Tainan, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); G06F 16/2457 (2019.01); G06F 7/20 (2006.01); G05B 23/02 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4184 (2013.01); G05B 19/41875 (2013.01); G05B 19/41885 (2013.01); G06F 7/20 (2013.01); G06F 16/24578 (2019.01); G05B 2219/45032 (2013.01); Y02P 90/02 (2015.11);
Abstract
Embodiments of the present invention provide a two-phase process for searching the root causes of the yield loss in the production line. In a first phase, process tools and their process tool types that are likely to cause the yield loss are identified, and in a second phase, the process parameters that are likely to cause the yield loss within the process tool types found in the first phase are identified. In each phase, two different algorithms can be used to generate a reliance index (RI) for gauge the reliance levels of their search results.