The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Mar. 18, 2015
Applicant:

Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Xuanyong Liu, Shanghai, CN;

Tao Lu, Shanghai, CN;

Heying Wang, Shanghai, CN;

Fanhao Meng, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 7/14 (2006.01); C08J 7/12 (2006.01); C08J 5/04 (2006.01); A61L 27/18 (2006.01);
U.S. Cl.
CPC ...
C08J 7/123 (2013.01); A61L 27/18 (2013.01); C08J 5/042 (2013.01); C08J 7/12 (2013.01); C08J 7/126 (2013.01); C08J 7/14 (2013.01); A61L 2400/18 (2013.01); A61L 2430/02 (2013.01); C08J 2371/00 (2013.01); C08J 2371/10 (2013.01);
Abstract

The present invention relates to a surface modification method for a polyether-ether-ketone material. The method combines physical and chemical methods, and comprises the steps of performing plasma immersion ion implantation on the surface of the polyether-ether-ketone material with argon as an ion source, and then, soaking the polyether-ether-ketone material treated by plasma immersion ion implantation in a hydrogen peroxide aqueous solution, hydrofluoric acid aqueous solution, or ammonia water to make the surface of the modified polyether-ether-ketone material have nanoparticles, shallow nanoporous structures, and/or ravined nanostructures.


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