The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2021

Filed:

Feb. 12, 2019
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Gaku Miyake, Osaka, JP;

Genichiro Matsuda, Nara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/46 (2006.01); C02F 1/32 (2006.01); H05H 1/48 (2006.01);
U.S. Cl.
CPC ...
C02F 1/4608 (2013.01); C02F 1/32 (2013.01); H05H 1/48 (2013.01); C02F 2301/026 (2013.01);
Abstract

A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.


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