The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Dec. 17, 2019
Bae Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Michael J. DeWeert, Kaneohe, HI (US);
BAE Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Abstract
Systems and methods for computationally simulating and optimizing shearography systems are provided. The systems and methods for simulation and optimization avoid ray tracing, and, instead, implement a phase screen approach to image computation. The systems and methods include physics-based surface texture and surface motion simulations, the application of phase screens to computer-generated simulations of shearographic remote sensing, and the inclusion of de-polarization due to multiple scattering and birefringence at a surface being imaged. The systems and methods include further greatly optimize diffraction computations by treating an optical transfer function (OTF) of an arbitrary aperture as a sum of separable OTFs.