The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2021

Filed:

Aug. 21, 2018
Applicant:

Hewlett Packard Enterprise Development Lp, Houston, TX (US);

Inventors:

Amit S. Sharma, Palo Alto, CA (US);

Suhas Kumar, Palo Alto, CA (US);

Xia Sheng, Palo Alto, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 13/00 (2006.01); H01L 45/00 (2006.01); H01L 27/24 (2006.01); G11C 8/14 (2006.01);
U.S. Cl.
CPC ...
G11C 13/0028 (2013.01); G11C 8/14 (2013.01); G11C 13/003 (2013.01); G11C 13/0026 (2013.01); H01L 27/2481 (2013.01); H01L 45/1233 (2013.01); H01L 45/146 (2013.01); H01L 45/1658 (2013.01); H01L 45/1666 (2013.01); H01L 45/1253 (2013.01);
Abstract

A memristor device includes a first electrode, a second electrode, and a memristor layer disposed between the first electrode and the second electrode. The memristor layer is formed of a metal oxide. The memristor layer includes a plurality of regions that extend between the first electrode and the second electrode. The plurality of regions of the memristor layer are created with different concentrations of oxygen before electrical operation, and, during electrical operation, a voltage-conductance characteristic of the memristor device is controlled based on the different concentrations of oxygen of the plurality of regions. The controlling of the voltage-conductance characteristic includes increasing or decreasing the conductance of the memristor device toward a target conductance at a specific voltage.


Find Patent Forward Citations

Loading…