The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Aug. 23, 2017
Nec Laboratories America, Inc., Princeton, NJ (US);
Jianwu Xu, Lawrenceville, NJ (US);
Biplob Debnath, Princeton, NJ (US);
Bo Zong, Plainsboro, NJ (US);
Hui Zhang, Princeton Junction, NJ (US);
Guofei Jiang, Princeton, NJ (US);
Hancheng Ge, College Station, TX (US);
Abstract
A heterogeneous log pattern editing recommendation system and computer-implemented method are provided. The system has a processor configured to identify, from heterogeneous logs, patterns including variable fields and constant fields. The processor is also configured to extract a category feature, a cardinality feature, and a before-after n-gram feature by tokenizing the variable fields in the identified patterns. The processor is additionally configured to generate target similarity scores between target fields to be potentially edited and other fields from among the variable fields in the heterogeneous logs using pattern editing operations based on the extracted category feature, the extracted cardinality feature, and the extracted before-after n-gram feature. The processor is further configured to recommend, to a user, log pattern edits for at least one of the target fields based on the target similarity scores between the target fields in the heterogeneous logs.