The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Sep. 25, 2018
Kokusai Electric Corporation, Tokyo, JP;
Satoshi Aizawa, Toyama, JP;
Hiroto Iwaki, Toyama, JP;
KOKUSAI ELECTRIC CORPORATION, Tokyo, JP;
Abstract
A technique is capable of preventing particles from adhering onto a wafer when a lid is attached or detached from a pod. A substrate processing apparatus includes: a placement part whereon a substrate container is placed; a guide part constituting a lid opening/closing space; a gate part separating the lid opening/closing space from a transfer chamber; a lid opening/closing mechanism provided in the lid opening/closing space and configured to attach or detach a lid of the substrate container; a gas introduction mechanism configured to supply a gas into the substrate container; a monitor part configured to monitor and adjust an inner pressure of the substrate container; and a controller configured to: (i) control the lid opening/closing mechanism; and (ii) control the monitor part to maintain the inner pressure of the substrate container higher than an inner pressure of the lid opening/closing space while the lid opening/closing mechanism detaches the lid.