The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2021

Filed:

Nov. 01, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Vinay Dhawan, Noida, IN;

Siddharth Saraya, Raniganj, IN;

Deepak Gupta, Indirapuram, IN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/00 (2006.01); G03H 1/22 (2006.01);
U.S. Cl.
CPC ...
G03H 1/0005 (2013.01); G03H 1/22 (2013.01); G03H 2001/0088 (2013.01); G03H 2210/30 (2013.01); G03H 2226/02 (2013.01);
Abstract

A method and system for improving holographic image simulation and replication is provided. The method includes receiving data identifying a primary location and at least one secondary location associated with a holographic replication event. First video data describing first objects at the primary location is received and a first holographic simulation presentation comprising virtual representations of the first objects is generated. Second video data describing second objects at the at least one secondary location is received and a second holographic simulation presentation comprising virtual representations of the second objects is generated. The second holographic simulation presentation is projected such that said virtual representations of the second objects interact with the first objects at the primary location. The first holographic simulation presentation is projected such that said virtual representations of the first objects interact with the second objects at the at least one secondary location.


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