The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2021

Filed:

Dec. 07, 2016
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Michiie Sakamoto, Tokyo, JP;

Akinori Hashiguchi, Tokyo, JP;

Shinobu Masuda, Tokyo, JP;

Tsuguhide Sakata, Machida, JP;

Tsutomu Shimada, Musashino, JP;

Hirotake Ando, Tokyo, JP;

Kazuhiko Kato, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/26 (2006.01); G02B 21/34 (2006.01); G02B 21/24 (2006.01); G02B 21/36 (2006.01);
U.S. Cl.
CPC ...
G02B 21/26 (2013.01); G02B 21/24 (2013.01); G02B 21/244 (2013.01); G02B 21/34 (2013.01); G02B 21/365 (2013.01); G02B 21/367 (2013.01);
Abstract

A microscope system includes an observation optical system including an objective lens, an XY stage capable of moving an XY plane in an X-axis direction and an Y-axis direction, a first change unit configured to change a slant of the XY plane with respect to an optical axis direction of the objective lens, and a second change unit configured to change a slant of a slide placed on the XY stage with respect to the XY plane. Changing the slant of the XY plane by the first change unit is performed based on a first mark arranged on the XY plane at a position observable by the observation optical system. Changing the slant of the slide with respect to the XY plane by the second change unit is performed based on a second mark arranged on the slide.


Find Patent Forward Citations

Loading…