The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Dec. 06, 2018
Korea Atomic Energy Research Institute, Daejeon, KR;
Jang-Soon Kwon, Goyang-si, KR;
Yong-Kwon Koh, Daejeon, KR;
Jae-Kwang Lee, Daejeon, KR;
Min-Hoon Baik, Daejeon, KR;
KOREA ATOMIC ENERGY RESEARCH INSTITUTE, Daejeon, KR;
Abstract
An integrated monitoring system for radiological surveillance of groundwater and an operation method thereof are disclosed. The integrated monitoring system for radiological surveillance of groundwater around a nuclear facility according to an embodiment of the present disclosure may include a field monitoring system configured to monitor sectionally isolated groundwater characteristics by establishing a multiple packer system at each depth in groundwater around the nuclear facility, and measure whether or not radioactive contamination has occurred at each depth in groundwater pumped through an automatic branching apparatus connected to a sectional groundwater flow pipe isolatedly disposed at the each depth, and convert field measurement data acquired based on the measurement result into a DB and transmit the DB to a remote monitoring apparatus over a network, and the remote monitoring apparatus configured to remotely control the field monitoring system, and receive the DB-based field measurement data from the field monitoring system, and analyze the received field measurement data to predict a radioactive contaminant source, and provide a contaminant plume showing the distribution characteristics of contaminants in 3D graphic processing.