The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2021

Filed:

Jan. 05, 2018
Applicants:

Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Zhiming Lin, Beijing, CN;

Zhen Wang, Beijing, CN;

Baojun Li, Beijing, CN;

Zhi Yin, Beijing, CN;

Chun-Chieh Huang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 5/00 (2006.01); F26B 21/00 (2006.01); F26B 21/12 (2006.01); F26B 25/00 (2006.01); B08B 5/02 (2006.01);
U.S. Cl.
CPC ...
F26B 5/00 (2013.01); F26B 21/004 (2013.01); F26B 21/12 (2013.01); F26B 25/00 (2013.01); B08B 5/02 (2013.01);
Abstract

A drying system and a drying method for a cleaning solution on a mask are disclosed. The drying system includes: a drying chamber having a first side wall and a second side wall arranged opposite to the first side wall; a plurality of first air knives on the first side wall and the second side wall for air-drying a cleaned mask; and a separation device for allowing a mask strip and a supporting and shielding strip to move away from each other at a spatial intersection region to increase a spacing between the mask strip and the supporting and shielding strip at the spatial intersection region, when the plurality of first air knives are air-drying the cleaned mask.


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