The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Jul. 27, 2016
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Abstract
A deposition mask, which are capable of enhancing close contact between a substrate for vapor deposition and a peripheral region of each opening in the deposition mask during vapor deposition, suppressing the occurrences of film blurs and shadows during vapor deposition, and performing high definition patterning, a method for manufacturing the same, and a vapor deposition method using the deposition mask, are provided. A deposition mask () comprises a resin film () having a pattern of openings () for forming a thin layer pattern by vapor deposition on a substrate for vapor deposition (). The deposition mask () includes a magnetic metal layer () provided on at least a peripheral portion of each opening () of a surface of the resin film () to be brought into contact with the substrate for vapor deposition (), thereby enhancing close contact between the substrate for vapor deposition () and the peripheral region of each opening () of the deposition mask () during vapor deposition, and suppressing the occurrences of film blurs and shadows during vapor deposition.