The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2021

Filed:

Sep. 28, 2018
Applicant:

The Boeing Company, Chicago, IL (US);

Inventors:

Om Prakash, Bangalore, IN;

Megha Sahu, Bangalore, IN;

Assignee:

The Boeing Company, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/165 (2017.01); B29C 64/106 (2017.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); B22F 1/00 (2006.01); B22F 3/11 (2006.01); B29C 64/245 (2017.01); B22F 3/105 (2006.01); B33Y 70/00 (2020.01); B33Y 30/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/165 (2017.08); B22F 1/0062 (2013.01); B22F 1/0074 (2013.01); B22F 3/1055 (2013.01); B22F 3/1118 (2013.01); B29C 64/106 (2017.08); B29C 64/245 (2017.08); B22F 2003/1057 (2013.01); B22F 2003/1058 (2013.01); B29K 2995/0005 (2013.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12);
Abstract

A method of additive manufacturing is provided. The method includes depositing a layer of polymeric material from which an additively manufactured part is produced. The method also includes depositing a slurry upon the layer of polymeric material, wherein the slurry includes a conductive material that imparts conductive properties to the layer of polymeric material.


Find Patent Forward Citations

Prakash, Om. (2021). Methods and apparatus for additively manufacturing a structure with in-situ reinforcement (U.S. Patent No. 10926461). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10926461

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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