The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2021
Filed:
Jun. 15, 2018
Lutronic Vision Inc., Burlington, MA (US);
Seth Adrian Miller, Longmont, CO (US);
Mark Meloni, Longmont, CO (US);
LUTRONIC VISION INC, Burlington, MA (US);
Abstract
A dosimetry system may comprise a film stack and a laser system for applying a laser beam to the film stack. The system may further comprise an interferometry system configured to acquire from the film stack a first interferometric dataset comprising a first composite signal and a subsequent interferometric dataset comprising a subsequent composite signal. The system may also include a processor for comparing the first and subsequent composite signals, wherein a difference between the first and subsequent composite signals indicates a change in the film stack thickness. A dosimetry method may comprise applying a laser beam to such a film stack, acquiring the first and subsequent interferometric datasets, comparing them to detect a change in the film stack thickness, and ceasing to apply the laser beam to the film stack if the change in the film stack thickness exceeds a predetermined threshold.