The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

May. 29, 2019
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventor:

Matthew Charles, Grenoble, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); C30B 25/02 (2006.01); C30B 29/40 (2006.01); H01L 33/06 (2010.01); H01L 33/04 (2010.01); H01L 21/02 (2006.01); H01L 33/02 (2010.01);
U.S. Cl.
CPC ...
H01L 33/0075 (2013.01); C30B 25/02 (2013.01); C30B 29/406 (2013.01); H01L 21/0251 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02507 (2013.01); H01L 33/007 (2013.01); H01L 33/0025 (2013.01); H01L 33/025 (2013.01); H01L 33/04 (2013.01); H01L 33/06 (2013.01);
Abstract

A method for manufacturing a light-emitting diode is provided, including the following steps in succession, while maintaining a substrate in a vapour-phase epitaxial growth chamber: epitaxial deposition, with an atmosphere having a first non-zero concentration of ammonia in the chamber, of a first GaN alloy layer P-doped with magnesium; epitaxial deposition, on the first GaN alloy layer, of a sacrificial GaN alloy layer in a second atmosphere in the chamber that is not supplied with magnesium; placing the second atmosphere inside the chamber under conditions with a second concentration of ammonia that is at least equal to a third of the first non-zero concentration so as to remove the sacrificial GaN layer; and then epitaxial deposition of a second N-type doped GaN alloy layer so as to form a tunnel junction with the first GaN alloy layer.


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