The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Jun. 07, 2018
Applicants:

Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Yong Peng, Beijing, CN;

Pengju Zhang, Beijing, CN;

Xin Li, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1362 (2006.01); H01L 29/417 (2006.01); G02F 1/1333 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1259 (2013.01); G02F 1/136286 (2013.01); H01L 27/124 (2013.01); H01L 29/41733 (2013.01); G02F 1/13338 (2013.01); G02F 2001/136295 (2013.01); G06F 3/0412 (2013.01); G06F 2203/04103 (2013.01);
Abstract

A method for manufacturing an array substrate includes: forming a strip-shaped barrier wall(s) on a base substrate, wherein the width of each barrier wall is less than or equal to a distance between a first metal trace to be formed and a second metal trace to be formed; and forming a first metal trace at one side of each barrier wall located in a direction perpendicular to an extending direction of the barrier wall, and forming a second metal trace at an opposite side of the barrier wall located in the direction perpendicular to the extending direction of the barrier wall.


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