The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Dec. 05, 2016
Applicant:
Ion Beam Services, Peynier, FR;
Inventors:
Frank Gilbert Torregrosa, Simiane, FR;
Laurent Roux, Marseilles, FR;
Assignee:
ION BEAM SERVICES, Peynier, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/48 (2006.01); H01J 37/317 (2006.01); H01J 37/02 (2006.01); H01L 21/223 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32412 (2013.01); C23C 14/48 (2013.01); H01J 37/026 (2013.01); H01J 37/3171 (2013.01); H01J 37/32174 (2013.01); H01J 37/32357 (2013.01); H01J 37/32422 (2013.01); H01J 37/32706 (2013.01); H01J 37/32871 (2013.01); H01J 2237/0044 (2013.01); H01L 21/2236 (2013.01);
Abstract
A method of controlling an implanter operating in plasma immersion, the method including the steps of: The method is remarkable in that the duration of the expulsion stage is longer than 5 μs. The invention also provides a power supply for biasing an implanter.