The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Feb. 12, 2018
Applicant:
Ionics France, Hérouville-Saint-Clair, FR;
Inventors:
Denis Busardo, Gonneville-sur-Mer, FR;
Frédéric Guernalec, Liffre, FR;
Assignee:
IONICS FRANCE, Hérouville-Saint-Clair, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); G02B 1/113 (2015.01); H01J 37/317 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); G02B 1/113 (2013.01); H01J 37/3171 (2013.01); G06F 3/041 (2013.01);
Abstract
Process for treatment of a sapphire part with a beam of a mixture of mono- and multicharged ions of a gas which are produced by an electron cyclotron resonance (ECR) source, where: A part made of sapphire having a high transmittance and which is resistant to scratching is thus advantageously obtained.