The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Feb. 25, 2019
Fujifilm Corporation, Tokyo, JP;
Takashi Murooka, Kanagawa, JP;
Kazuo Onishi, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a microneedle array imaging device, a microneedle array imaging method, a microneedle array inspection device, and a microneedle array inspection method which enable inspection of a microneedle array with high accuracy based on an obtained image. A microneedle arrayis imaged from a side of a surface on which microneedlesare arranged by irradiating a surface on a side opposite to the surface on which the microneedlesare arranged with parallel light as illumination light. At this time, the surface is irradiated with the illumination light under conditions in which an incident angle α of light onto a bottom surfaceof the microneedleis 90−θ° or greater and an incident angle β of light onto a side surfaceof the microneedleis less than a critical angle γ. In this manner, a state in which almost no light is emitted from a tip portion of the microneedlecan be generated. As the result, an image in which only the tip portion of the microneedleis dark and other portions, in other words, a base portion of the microneedleand a portion of a sheetare bright can be imaged.