The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Feb. 20, 2020
Deep Isolation, Inc., Berkeley, CA (US);
Richard A. Muller, Berkeley, CA (US);
John Linus Grimsich, Berkeley, CA (US);
Deep Isolation, Inc., Berkeley, CA (US);
Abstract
Techniques for determining the suitability of a subterranean formation as a hazardous waste repository include determining a concentration of at least one noble gas isotope of a plurality of noble gas isotopes in fluid sample from a subterranean formation below a terranean surface; determining a produced amount of the at least one noble gas isotope in the subterranean formation based on a production rate of the at least one noble gas isotope and a minimum residence time; calculating a ratio of the determined concentration of the at least one noble gas isotope in the fluid sample to the determined produced amount of the at least one noble gas isotope; and based on the calculated ratio being at or near a threshold value, determining that the subterranean formation is suitable as a hazardous waste repository.