The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Jul. 25, 2019
Faurecia Emission Control Technologies (Shanghai) Co., Ltd., Shanghai, CN;
Jie Wang, Shanghai, CN;
Gerard Bertran, Shanghai, CN;
Faurecia Emission Control Technologies (Shanghai) Co., Ltd., Shanghai, CN;
Abstract
The present disclosure relates to a mixer and an exhaust aftertreatment system comprising the mixer. The mixer comprises a shell, an injection port, a first baffle, a second baffle, a deflector, and an impactor, wherein the first baffle is provided with a gas inlet, the second baffle is provided with a gas outlet, the first baffle and the second baffle are disposed opposite each other, and the first baffle, the second baffle and the shell provide a flow space for an exhaust gas to flow in the mixer; and in the flow space, the first baffle, the shell, the deflector and the impactor provide a mixing space, the deflector comprises a first deflecting surface opposite the first baffle, the deflector is disposed adjacent to the impactor, and the impactor is disposed opposite the injection port for impacting a liquid injected from the injection port into the mixing space. The mixer and the exhaust aftertreatment system have the advantages of a simple structure and a high processing efficiency.