The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Mar. 16, 2018
Applicant:

Ripelocker Llc, Bainbridge Island, WA (US);

Inventors:

George Frank Lobisser, Bainbridge Island, WA (US);

G. Kyle Lobisser, Bainbridge Island, WA (US);

Todd Hansen, Bainbridge Island, WA (US);

Eric Levi, Bainbridge Island, WA (US);

Justin Chase Bothell, Poet Townsend, WA (US);

Assignee:

Ripelocker LLC, Bainbridge Island, WA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B65B 31/02 (2006.01); B65B 25/00 (2006.01); B65D 85/34 (2006.01); B65D 81/20 (2006.01);
U.S. Cl.
CPC ...
B65B 31/025 (2013.01); B65B 25/001 (2013.01); B65D 81/2038 (2013.01); B65D 85/34 (2013.01);
Abstract

A system and method for storing perishable items under controlled atmospheric conditions is provided. Total atmospheric pressure within a vacuum chamber containing the perishable items is reduced to below a predetermined total pressure limit. Oxygen partial pressure within the chamber is monitored. When the Oxygen partial pressure falls below a predetermined lower Oxygen partial pressure limit, an Oxygen-containing gas is admitted to the vacuum chamber to raise the Oxygen partial pressure above the lower Oxygen partial pressure limit. Total atmospheric pressure within the chamber is also monitored. When the total atmospheric pressure reaches or exceed the predetermined total pressure limit, total pressure within the vacuum chamber is once again reduced below the predetermined total pressure limit.


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