The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Dec. 29, 2018
China Banknote Ink Co., Ltd., Shanghai, CN;
China Banknote Printing and Minting Corporation, Beijing, CN;
Xing Zhang, Shanghai, CN;
Qingfei Meng, Shanghai, CN;
Yong Zhang, Shanghai, CN;
Xiaoquan Zhou, Shanghai, CN;
Guolin Yuan, Shanghai, CN;
Shifan Zhang, Shanghai, CN;
CHINA BANKNOTE INK CO., LTD., Shanghai, CN;
CHINA BANKNOTE PRINTING AND MINTING CORPORATION, Beijing, CN;
Abstract
An anti-counterfeiting pattern having an optically variable structure, comprising lithographic lines and gravure blind embossed relief lines printed on a carrier. The lithographic lines are a set of lithographic curve lines having a curvature, the widths of the lithographic curve lines changing from thick to thin, or thin to thick. The gravure blind embossed relief lines are a set of curve lines corresponding to the lithographic lines, and having the same curvature. The relief lines are overprinted on the lithographic lines with a width variation identical to that of said lithographic lines. Accurate overprinting of the two printing types forms a curved relief structure wherein the width of the lines changes continuously. When a printed product is rotated and observed, a continuously variable optical effect will be seen, which is visual, readily to identify, anti-copying and difficult to forgery.