The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Apr. 11, 2019
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Kazuhiro Sato, Utsunomiya, JP;

Noriyasu Hasegawa, Utsunomiya, JP;

Takahiro Matsumoto, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/58 (2006.01); G03F 7/00 (2006.01); B29C 35/08 (2006.01); B29C 43/52 (2006.01); G01B 11/14 (2006.01); G02B 5/18 (2006.01); G02B 27/14 (2006.01); H01L 21/56 (2006.01); B29L 31/34 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
B29C 43/58 (2013.01); B29C 35/0805 (2013.01); B29C 43/52 (2013.01); G01B 11/14 (2013.01); G02B 5/1861 (2013.01); G02B 27/141 (2013.01); G03F 7/0002 (2013.01); H01L 21/565 (2013.01); B29C 2035/0827 (2013.01); B29C 2043/585 (2013.01); B29C 2043/5816 (2013.01); B29L 2031/34 (2013.01); G02B 5/20 (2013.01);
Abstract

The present invention provides an imprint apparatus that molds an imprint material on a shot region of a substrate by using a mold, comprising a detection unit configured to detect first light with which a first mark of the mold and a second mark of the substrate are irradiated and measure a position deviation between the first mark and the second mark, a heating unit configured to irradiate the substrate with second light for heating the substrate and deforming the shot region, and a control unit configured to control alignment between the mold and the substrate based on the position deviation, wherein a parameter of the detection unit or the heating unit is set not to detect the second light by the detection unit while the first light is detected and the substrate is irradiated with the second light.


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