The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2021

Filed:

Jul. 20, 2018
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Jehyuk Rhee, Newbury Park, CA (US);

Angelika Kononenko, Newbury Park, CA (US);

Christian M. Boemler, Lompoc, CA (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 5/378 (2011.01); H04N 5/33 (2006.01); H04N 5/3745 (2011.01);
U.S. Cl.
CPC ...
H04N 5/378 (2013.01); H04N 5/33 (2013.01); H04N 5/37457 (2013.01);
Abstract

Methods and apparatus for a dual mode focal plane array having a background module including a first capacitor to integrate a first signal for a first amount of time, wherein the first signal comprises a background signal, and a signal module including a second capacitor to integrate a second signal for a second amount of time, wherein the second signal comprises a signal of interest and the background signal, wherein the first and second capacitors have impedance values in a first ratio, and wherein the first amount of time and the second amount of time define a second ratio corresponding to the first ratio.


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