The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Jun. 03, 2019
Applicant:
Enevate Corporation, Irvine, CA (US);
Inventors:
Liwen Ji, San Diego, CA (US);
Benjamin Yong Park, Mission Viejo, CA (US);
Robert A. Rango, Newport Coast, CA (US);
Dong Sun, Irvine, CA (US);
Frederic C. Bonhomme, Lake Forest, CA (US);
Assignee:
Enevate Corporation, Irvine, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/134 (2010.01); H01M 4/36 (2006.01); H01M 4/04 (2006.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/134 (2013.01); H01M 4/044 (2013.01); H01M 4/049 (2013.01); H01M 4/366 (2013.01); H01M 2004/027 (2013.01);
Abstract
The present application describes the use of a solid electrolyte interphase (SEI) fluorinating precursor and/or an SEI fluorinating compound to coat an electrode material and create an artificial SEI layer. These modifications may increase surface passivation of the electrodes, SEI robustness, and structural stability of the silicon-containing electrodes.