The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10916641 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 09, 2021

Filed:

Mar. 22, 2019
Applicant:

Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, CN;

Inventors:

Xiaohui Nie, Wuhan, CN;

Jiawei Zhang, Wuhan, CN;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66757 (2013.01); H01L 21/26513 (2013.01); H01L 29/78642 (2013.01);
Abstract

The present application provides a thin film transistor, a method of manufacturing a thin film transistor, and a manufacturing system. The thin film transistor includes a substrate, a buffer layer, an active layer, and a gate insulating layer. A side area of the active layer is doped and modified, so that a surface of the side area is formed as a high resistance area, and then the gate insulating layer is formed by a chemical deposition process, thereby to avoid a weak channel current produced by unintentional electrically conduction of a boundary of the active layer due to a thinner thickness of the gate insulating layer when operating, thereby increasing electrical reliability of the thin film transistor.


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