The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Dec. 13, 2018
Avava, Inc., Boston, MA (US);
Charles Holland Dresser, Wayland, MA (US);
Jayant Bhawalkar, Auburndale, MA (US);
Joseph Ting, Acton, MA (US);
Avava, Inc., Waltham, MA (US);
Abstract
An electromagnetic beam scanning system and corresponding method of use is provided. The system includes a motor, a reciprocating mechanism, and a focus optic. The motor is configured to generate a rotational movement. The reciprocating mechanism is operatively coupled with the motor and configured to convert the rotational movement to a reciprocating movement including a plurality of strokes along a first scanned axis. The reciprocating movement has a constant speed over a portion of at least one stroke of the plurality of strokes. The focus optic is operatively coupled to the reciprocating mechanism such that the focus optic moves experiences the reciprocating movement of the reciprocating mechanism. The focus optic is configured to focus an electromagnetic radiation (EMR) beam incident upon the focus optic to a focus along an optical axis substantially orthogonal to the first scanned axis.