The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Sep. 27, 2019
Applicant:
Imec Vzw, Leuven, BE;
Inventor:
Henricus Philipsen, Leuven, BE;
Assignee:
IMEC VZW, Leuven, BE;
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/44 (2006.01); H01L 23/532 (2006.01); H01L 21/768 (2006.01); C23C 18/54 (2006.01); H01L 21/288 (2006.01); H05K 3/18 (2006.01); H01L 21/285 (2006.01); H05K 3/46 (2006.01);
U.S. Cl.
CPC ...
C23C 18/44 (2013.01); C23C 18/54 (2013.01); H01L 21/288 (2013.01); H01L 21/28556 (2013.01); H01L 21/76843 (2013.01); H01L 21/76879 (2013.01); H01L 23/53242 (2013.01); H01L 23/53257 (2013.01); H05K 3/181 (2013.01); H05K 3/4661 (2013.01);
Abstract
An oxygen-free or oxygen-poor solution for the electroless deposition of a platinum group metal is described. The solution includes a ruthenium (II) amine complex having a first oxidation potential, and a platinum group metal compound having a reduction potential larger than the opposite of the oxidation potential of the ruthenium (II) amine complex.