The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2021
Filed:
Nov. 02, 2017
Honeywell International Inc., Morris Plains, NJ (US);
Haiyou Wang, Amherst, NY (US);
Hsueh Sung Tung, Getzville, NY (US);
Willie Josue Perez, Hudson, OH (US);
Yian Zhai, Williamsville, NY (US);
Ralph John Borowski, Depew, NY (US);
Fang Huang Tu, Amherst, NY (US);
Lucas Peter Labuda, Amherst, NY (US);
John L. Welch, Williamsville, NY (US);
Honeywell International Inc., Charlotte, NC (US);
Abstract
The invention relates to a process for reducing the concentration of a fluorinated alkyne impurity, such as 3,3,3-trifluoropropyne (TFPY), in 2,3,3,3-tetrafluoropropene (HFO-1234yf) which comprises contacting such a mixture with a caustic material, such as sodium hydroxide (NaOH), under conditions effective to reduce the concentration of the fluorinated alkyne impurity, including in some practices reducing the concentration by at least about 50%.