The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Apr. 01, 2019
Applicant:

Korea University Research and Business Foundation, Seoul, KR;

Inventors:

Cheol Jin Lee, Seoul, KR;

Sang Heon Lee, Seoul, KR;

Jun Soo Han, Uijeongbu-si, KR;

Han Bin Go, Seongnam-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G 1/02 (2006.01); H01J 35/06 (2006.01); H05G 1/34 (2006.01);
U.S. Cl.
CPC ...
H05G 1/02 (2013.01); H01J 35/06 (2013.01); H05G 1/34 (2013.01); H01J 2201/30469 (2013.01);
Abstract

The present disclosure relates to an X-ray source apparatus and a control method of the X-ray source apparatus in which a cathode electrode and a gate electrode are arranged in an array form to enable matrix control, and, thus, it is possible to irradiate X-rays at an optimum dose for each position on the subject. Therefore, it is possible to suppress the irradiation of more X-rays than are needed to the subject. Also, it is possible to obtain a high-resolution and high-quality X-ray image. As such, two-dimensional matrix control makes it easy to control the dose of X-rays and makes it possible to uniformly irradiate X-rays to the subject. Therefore, it is possible to manufacture a high-resolution surface X-ray source with less dependence on the size of the focus of electron beams.


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