The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Sep. 13, 2017
Applicant:

Lg Innotek Co., Ltd., Seoul, KR;

Inventors:

Rak Jun Choi, Seoul, KR;

Byeoung Jo Kim, Seoul, KR;

Hyun Jee Oh, Seoul, KR;

Sung Ho Jung, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/32 (2010.01); H01L 33/06 (2010.01); H01L 33/10 (2010.01); H01L 33/14 (2010.01); H01L 33/48 (2010.01); H01L 33/02 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 33/025 (2013.01); H01L 33/06 (2013.01); H01L 33/10 (2013.01); H01L 33/145 (2013.01); H01L 33/48 (2013.01); H01L 2224/48091 (2013.01);
Abstract

An embodiment discloses a semiconductor device including a light emitting structure including a first conductive semiconductor layer, a second conductive semiconductor layer, and an active layer disposed between the first conductive semiconductor layer and the second conductive semiconductor layer; a first electrode electrically connected with the first conductive semiconductor layer; and a second electrode electrically connected with the second conductive semiconductor layer, and a semiconductor device package including the same. The second conductive semiconductor layer includes a first surface on which the second electrode is disposed. The second conductive semiconductor layer has a ratio of a second shortest distance W, which is a distance from the first surface to a second point, to a first shortest distance W, which is a distance from the first surface to a first point, (W:W) ranging from 1:1.25 to 1:100. The first point is a point at which the second conductive semiconductor layer has the same aluminum composition as a well layer of the active layer closest to the second conductive semiconductor layer. The second point is a point at which the second conductive semiconductor layer has the same dopant composition as the aluminum composition.


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