The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Nov. 05, 2014
Applicant:

Cree, Inc., Durham, NC (US);

Inventors:

Daniel Jenner Lichtenwalner, Raleigh, NC (US);

Lin Cheng, Chapel Hill, NC (US);

John Williams Palmour, Cary, NC (US);

Assignee:

Cree, Inc., Durham, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/51 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/513 (2013.01); H01L 29/1033 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01); H01L 29/517 (2013.01); H01L 29/66068 (2013.01); H01L 29/66712 (2013.01); H01L 29/7802 (2013.01);
Abstract

A semiconductor device includes a semiconductor body and an insulated gate contact on a surface of the semiconductor body over an active channel in the semiconductor device. The insulated gate contact includes a channel mobility enhancement layer on the surface of the semiconductor body, a diffusion barrier layer over the channel mobility enhancement layer, and a dielectric layer over the diffusion barrier layer. By using the channel mobility enhancement layer in the insulated gate contact, the mobility of the semiconductor device is improved. Further, by using the diffusion barrier layer, the integrity of the gate oxide is retained, resulting in a robust semiconductor device with a low on-state resistance.


Find Patent Forward Citations

Loading…