The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Jul. 03, 2019
Applicant:

SK Hynix Inc., Icheon-si, KR;

Inventors:

Min Woo Park, Seoul, KR;

Kyo Yeon Cho, Seoul, KR;

Assignee:

SK hynix Inc., Icheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11582 (2017.01); H01L 27/11556 (2017.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); H01L 27/11556 (2013.01);
Abstract

Provided herein may be a semiconductor device and a method of manufacturing the same. The method of manufacturing the semiconductor device may include forming a tunnel insulating layer in a channel hole passing through a preliminary stack structure in which interlayer insulating layers and material layers are alternately stacked. The method may include forming recess areas by removing the material layers exposed through a slit passing through the preliminary stack structure. The method may include forming a data storage layer in the recess areas through the slit. The thickness of the data storage layer may be formed regardless of a size of the channel hole.


Find Patent Forward Citations

Park, Min. (2021). Semiconductor device and method of manufacturing the same (U.S. Patent No. 10910400). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10910400

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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