The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Jan. 17, 2020
Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventor:

Shuhei Yabu, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/21 (2006.01); H01J 37/12 (2006.01); H01J 37/141 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/263 (2013.01); H01J 37/12 (2013.01); H01J 37/141 (2013.01); H01J 37/1471 (2013.01); H01J 37/1475 (2013.01); H01J 37/1477 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01); H01J 2237/1501 (2013.01); H01J 2237/152 (2013.01);
Abstract

A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam downstream of the condenser lens system.


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