The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Jan. 17, 2018
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Junyoung Lee, Daejeon, KR;

Jun Won Choi, Daejeon, KR;

Chang Hun Yu, Daejeon, KR;

Ye Hoon Im, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F15D 1/02 (2006.01); F15D 1/00 (2006.01); B01D 53/94 (2006.01);
U.S. Cl.
CPC ...
F15D 1/0005 (2013.01); B01D 53/9431 (2013.01);
Abstract

A baffle apparatus for improving a flow deviation of a fluid due to the enlargement of a flow cross-section of the fluid including a plurality of baffle members. Each of the plurality of baffle members has a first part into which the fluid enters and a second part from which the fluid flows out, the first part and the second part are integrated, the first part of each of the plurality of baffle members is at a position where the flow cross-section of the fluid is enlarged and the second part of each of the plurality of baffle members is at the position where the flow cross-section of the fluid is constant, and ends of the first parts are spaced apart from each other by a distance satisfying the equation: and the second parts are spaced apart from each other by a uniform distance.


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