The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Jul. 27, 2017
Dexerials Corporation, Tokyo, JP;
Dexerials Corporation, Tokyo, JP;
Abstract
Provided are a block copolymer pattern formation method that enables formation, over a large area, of a block copolymer pattern with a perpendicularly oriented lamellar structure enabling nanoscale surface shape control, and a diffraction limited optical element produced using the block copolymer pattern formation method. The block copolymer pattern formation method is a method for forming a block copolymer pattern on a substrate and includes forming an oblique angle vapor deposited film on the substrate, applying a block copolymer onto the oblique angle vapor deposited film that has been formed, and subjecting the block copolymer that has been applied to perpendicularly oriented lamellar structure development post-treatment to form a pattern with a perpendicularly oriented lamellar structure.