The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Jun. 26, 2019
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Yuma Fukuzawa, Matsumoto, JP;

Motoki Takabe, Shiojiri, JP;

Shunsuke Watanabe, Matsumoto, JP;

Akira Miyagishi, Matsumoto, JP;

Shunya Fukuda, Azumino, JP;

Junichi Sano, Chino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/14 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1433 (2013.01); B41J 2/162 (2013.01); B41J 2/1626 (2013.01); B41J 2002/14491 (2013.01);
Abstract

A flow path formation substrate to which a nozzle plate is mounted includes a pressure chamber per nozzle, an individual supply path leading to the pressure chamber, an individual recovery path communicating with a flow channel near the nozzle. A conduction unit electrically coupled through a lead electrode to a pressure generator causing a pressure of the pressure chamber to vary is located at a position where the conduction unit overlaps with a flow path area of at least one individual flow path of the individual supply path or the individual recovery path in a plan view from a lamination direction in which the nozzle plate and the flow path formation substrate are laminated.


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