The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Apr. 17, 2017
Nissan Chemical Corporation, Tokyo, JP;
Tokyo Metropolitan University, Tokyo, JP;
Hiroyoshi Kawakami, Hachioji, JP;
Manabu Tanaka, Hachioji, JP;
Yuri Kameyama, Hachioji, JP;
Azusa Osawa, Hachioji, JP;
Tadayuki Isaji, Funabashi, JP;
Takamasa Kikuchi, Funabashi, JP;
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
TOKYO METROPOLITAN UNIVERSITY, Tokyo, JP;
Abstract
A method for producing a gas separation membrane, including the following steps: step (a): treating the surfaces of silica nanoparticles dispersed in a first solvent with a reactive functional group-containing compound, while nanoparticles are being dispersed in the solvent, to thereby prepare a first solvent dispersion of reactive functional group-modified silica nanoparticles; step (b): replacing the first solvent dispersion's dispersion medium of reactive functional group-modified silica nanoparticles prepared in step (a) with a second solvent without drying of dispersion medium, and then reacting functional group-modified silica nanoparticles with dendrimer-forming monomer or hyperbranched polymer-forming monomer in the second solvent's presence so that dendrimer or hyperbranched polymer is added to reactive functional group, to thereby prepare dendrimer- or hyperbranched polymer-bound silica nanoparticles; step (c): mixing dendrimer- or hyperbranched polymer-bound silica nanoparticles prepared in step (b) with a matrix resin; and step (d): applying mixture prepared in step (c) to a substrate, and then removing the solvent.