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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10905635 B1

PDFFull Text
Date of Patent:
Feb. 02, 2021

Filed:

Oct. 02, 2018

Gas-containing base material and manufacturing method therefor

Applicant:

Shinryo Corporation, Kyushu, JP;

Inventors:

Tooru Takeda, Kyushu, JP;

Hirokazu Toyoshima, Kyushu, JP;

Takeshi Sawai, Kyushu, JP;

Kazumi Inoue, Kyushu, JP;

Assignee:

Shinryo Corporation, Kita Kyushu, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Jianfeng Song

Int. Cl.
CPC ...
A61K 8/02 (2006.01); B01F 5/16 (2006.01); B01F 5/06 (2006.01); A23L 33/10 (2016.01); A61K 9/00 (2006.01); A61K 47/42 (2017.01); A61K 47/02 (2006.01); A61K 47/36 (2006.01); A61K 8/19 (2006.01); A61K 8/73 (2006.01); A61K 8/65 (2006.01); B01J 13/00 (2006.01); A23P 30/40 (2016.01); A61Q 19/00 (2006.01);
U.S. Cl.
CPC ...
A61K 8/0204 (2013.01); A23L 33/10 (2016.08); A23P 30/40 (2016.08); A61K 8/19 (2013.01); A61K 8/65 (2013.01); A61K 8/73 (2013.01); A61K 9/0087 (2013.01); A61K 47/02 (2013.01); A61K 47/36 (2013.01); A61K 47/42 (2013.01); B01F 5/0602 (2013.01); B01F 5/16 (2013.01); B01J 13/0065 (2013.01); A23V 2002/00 (2013.01); A61Q 19/00 (2013.01);
Abstract

A gas-containing base material including a functional-gas-containing composition, where the composition is a gel-like composition having a gelation temperature in a range of 0.5° C. or higher and 65° C. or lower at which a liquid form is able to be changed to a solid form by cooling, and where the composition contains an amount of a bubble state functional gas which exceeds a saturated solubility when the composition is in a liquid form.

Find Patent Forward Citations

Takeda, Tooru. (2021). Gas-containing base material and manufacturing method therefor (U.S. Patent No. 10905635). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10905635

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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