The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Nov. 20, 2018
Applicant:
Samsung Electro-mechanics Co., Ltd., Suwon-si, KR;
Inventors:
Sang Kee Yoon, Suwon-si, KR;
Nam Soo Park, Suwon-si, KR;
Hyung Jae Park, Suwon-si, KR;
Tae Kyung Lee, Suwon-si, KR;
Moon Chul Lee, Suwon-si, KR;
Assignee:
Samsung Electro-Mechanics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 9/17 (2006.01); H03H 3/02 (2006.01); H01L 21/3213 (2006.01); H03H 9/02 (2006.01);
U.S. Cl.
CPC ...
H03H 9/174 (2013.01); H01L 21/32135 (2013.01); H03H 3/02 (2013.01); H03H 9/02047 (2013.01); H03H 9/173 (2013.01); H03H 2003/021 (2013.01); H03H 2003/023 (2013.01);
Abstract
A method of manufacturing a bulk acoustic wave resonator includes: forming a sacrificial layer on a substrate protection layer; forming a membrane layer on the substrate protection layer to cover the sacrificial layer; and forming a cavity by removing the sacrificial layer using a gas mixture comprising a halide-based gas and an oxygen-containing gas, wherein a mixture ratio of the halide-based gas to the oxygen-containing gas in the gas mixture is in a range from 1.5 to 2.4.