The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Jan. 12, 2018
Applicant:

Toppan Printing Co., Ltd., Tokyo, JP;

Inventors:

Daisei Fujito, Tokyo, JP;

Kiyoaki Nishitsuji, Tokyo, JP;

Takehiro Nishi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); B05C 21/00 (2006.01); C23F 1/16 (2006.01); H01L 51/56 (2006.01); H05B 33/10 (2006.01); C23F 1/02 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0011 (2013.01); B05C 21/005 (2013.01); C23C 14/042 (2013.01); C23F 1/02 (2013.01); C23F 1/16 (2013.01); H05B 33/10 (2013.01); H01L 51/56 (2013.01);
Abstract

A metal mask substrate includes a metal obverse surface configured such that a resist is placed on the obverse surface. The obverse surface has a three-dimensional surface roughness Sa of less than or equal to 0.11 μm. The obverse surface also has a three-dimensional surface roughness Sz of less than or equal to 3.17 μm.


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