The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Jul. 28, 2017
Applicant:

Hrl Laboratories, Llc, Malibu, CA (US);

Inventors:

Yu Cao, Agoura Hills, CA (US);

Rongming Chu, Agoura Hills, CA (US);

Zijian Ray Li, Thousand Oaks, CA (US);

Assignee:

HRL Laboratories, LLC, Malibu, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/51 (2006.01); H01L 29/20 (2006.01); H01L 29/778 (2006.01); H01L 29/78 (2006.01); H01L 29/417 (2006.01); H01L 29/43 (2006.01); H01L 29/06 (2006.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/518 (2013.01); H01L 21/28264 (2013.01); H01L 29/0649 (2013.01); H01L 29/2003 (2013.01); H01L 29/41766 (2013.01); H01L 29/4236 (2013.01); H01L 29/4238 (2013.01); H01L 29/432 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01); H01L 29/7786 (2013.01); H01L 29/7787 (2013.01); H01L 29/7813 (2013.01); H01L 29/7828 (2013.01); H01L 29/42376 (2013.01); H01L 29/7788 (2013.01);
Abstract

A field effect transistor having at least a gate, source, and drain electrodes and a semiconductor channel for controlling transport of charge carriers between the source and drain electrodes, the gate being insulated from the channel by an dielectric, at least a portion of the dielectric disposed between the gate electrode and the semiconductor channel being doped or imbued with the an element which if doped or imbued into a semiconductor material would cause the semiconductor to be p-type. The p-type element used to dope or imbue the gate dielectric is preferably Mg.


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