The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Sep. 05, 2017
Applicant:

Focus-ebeam Technology (Beijing) Co., Ltd., Beijing, CN;

Inventors:

Wei He, Beijing, CN;

Shuai Li, Beijing, CN;

Peng Wang, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/09 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/09 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/2001 (2013.01); H01J 2237/202 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/2802 (2013.01);
Abstract

A vacuum condition processing apparatus is provided, the top of which is connected to an external charged particle beam generating device, and the apparatus includes: a suction cup in contact with the specimen to be observed or the stage holding the specimen, a first gas controlling device connected to an external gas supplying system, and a second gas controlling device connected to an external pumping system; a window is deployed at the top of the apparatus, through which the particle beam can go into the apparatus; the first gas controlling device is arranged to connect the gas supplying system and the suction cup; the second gas controlling device is arranged to connect the gas pumping system and the suction cup. Also disclosed is a specimen observation system and method.


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