The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2021

Filed:

Jul. 05, 2018
Applicant:

Samsung Electro-mechanics Co., Ltd., Suwon-Si, KR;

Inventors:

Sung Min Moon, Suwon-Si, KR;

Cheol Soon Kim, Suwon-Si, KR;

Yu Jong Kim, Suwon-Si, KR;

Dong Min Kim, Suwon-Si, KR;

Young Do Choi, Suwon-Si, KR;

Tae Ryung Hu, Suwon-Si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 27/28 (2006.01); H01F 27/29 (2006.01); H01F 41/24 (2006.01); H01F 27/32 (2006.01); H01F 17/04 (2006.01); H01F 17/00 (2006.01);
U.S. Cl.
CPC ...
H01F 27/2804 (2013.01); H01F 17/0013 (2013.01); H01F 17/04 (2013.01); H01F 27/29 (2013.01); H01F 27/292 (2013.01); H01F 27/324 (2013.01); H01F 27/327 (2013.01); H01F 41/24 (2013.01); H01F 2017/048 (2013.01); H01F 2027/2809 (2013.01);
Abstract

A coil component includes: a body including a support member including a through-hole, a first insulating layer disposed on the support member and including a first opening pattern, a second insulating layer disposed on the first insulating layer and including a second opening pattern, and a coil including a coil pattern filled in the first and second opening patterns; and external electrodes disposed on an outer surface of the body. The coil pattern has a stacking structure composed of a plurality of layers, and the plurality of layers includes a thin film conductor layer in contact with the support member, the thin film conductor layer extending to an entire lower surface of the first opening pattern and at least portions of side surfaces of the first opening pattern.


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