The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Mar. 28, 2019
Adobe Inc., San Jose, CA (US);
Xin Sun, Santa Clara, CA (US);
Nathan Aaron Carr, San Jose, CA (US);
Alexandr Kuznetsov, San Jose, CA (US);
ADOBE INC., San Jose, CA (US);
Abstract
Images are rendered from deeply learned raytracing parameters. Active learning, via a machine learning (ML) model (e.g., implemented by a deep neural network), is used to automatically determine, infer, and/or predict optimized, or at least somewhat optimized, values for parameters used in raytracing methods. Utilizing deep learning to determine optimized, or at least somewhat optimized, values for raytracing parameters is in contrast to conventional methods, which require users to rely of heuristics for parameter value setting. In various embodiments, one or more parameters regarding the termination and splitting of traced light paths in stochastic-based (e.g., Monte Carlo) raytracing are determined via active learning. In some embodiments, one or more parameters regarding the sampling rate of shadow rays are also determined.